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深紫外探測器

美國IRD公司,專門制造用于探測紫外、深紫外、真空極紫外和軟X射線光子的探測器。IRD公司是目前唯一能夠制造并商用的用于檢測VUV、EUV檢測的Si探測器生產廠家。

?AXUV系列主要用軟X射線、極紫外、X射線、低能離子等輻射探測。

光譜響應曲線
?
?提醒:我公司現在提供由 德國PTB提供的AXUV系列探測的標定服務 的業務

Absolute Devices / Transfer Standards
?Sensitive Area (mm2)Size (mm)Package TypeShunt Resistance (M-Ohm) @ 10 mVDark Current @ 50VCapacitance @ 0VRisetime (10%-90%)
AXUV10010010 X 10Ceramic100*20 nF**10 μSec**
AXUV100EUT ##10010 X 10Ceramic100*20 nF**10 μSec**
AXUVSP2966 X 16Ceramic100*20 nF**10 μSec**
AXUV96966 X 16Metal100*20 nF**10 μSec**
AXUV50HE1508 ?Ceramic10*3 nF**6 μSec**
AXUV20205 ?Metal1000*2 nF**2 μSec**
AXUV20A205 ?Ceramic100*5 nF**1 μSec**
AXUV20BNC205 ?BNC1000*2 nF**2 μSec**
AXUV20HE1205 ?Ceramic10*500 pF**0.2 μSec**
AXUV300 #33022 X 15Plastic20*40 nF**15 μSec**
AXUV300M/G33022 X 15Metal20*40 nF**15 μSec**
AXUV57657624 X 24Metal5*120 nF**50 μSec**
AXUV101010 X 1Ceramic1000*2 nF**2 μSec**
AXUV36@366 X 6Metal10*10 nF**10 μSec**
# AXUV-1600 with five AXUV-300 chips is available
## AXUV-100 photodiode with eutectically mounted chip for vacuum environments lower than 10^-9 torr
@ With 5 micron physical silicon thickness.
All AXUV products have at least 7 orders of magnitude of dynamic range.
Please specify if detectors with larger than dynamic range are required.

* May be selected for a specific application at no additional cost.
** Devices with better values may be selected.

Ref: "Stable Silicon Photodiodes for Absolute Intensity Measurements in the VUV and Soft X-ray Regions" E.M. Gullikson et. al., J. of Electron Spectroscopy and Related Phenoma, Vol. 80, 313-316 (1996)
AXUV Photodiodes for Position SensingClick name to download DWF Version of image
?Central Slit
(mm)
Sensitive Area
(mm2)
Size (mm)Package TypeShunt Resistance (M-Ohm)Dark Current @ 50VCapacitance @ OVRisetime (10-90%)


AXUVPS10.5?11 (X4)7.6?Metal100*2 nF**2μSec**
AXUVPS1A
AXUVPS1ALP
0.7?11(X4)7.6?Metal
Ceramic
100*2 nF**2μSec**
AXUVPS1B
AXUVPS1BLP
1?11 (X4)7.6?Metal100*2 nF**2μSec**
AXUVPS1G
AXUVPS1GLP
1.6?11 (X4)7.6?Metal100*2 nF**2μSec**
AXUVPS1D
AXUVPS1DLP
0.5 X 2.511 (X4)7.6?Metal100*2 nF**2μSec**
AXUVPS1E
AXUVPS1ELP
2 X 411 (X4)7.6?Metal100*2 nF**2μSec**
AXUVPS1F
AXUVPS1FLP
5?11 (X4)7.6?Metal100*2 nF**2μSec**
AXUVPS6
AXUVPS6S
N/A11 (X4)7.6?Metal100*2 nF**2μSec**
AXUVPS21 X 225 (X4)5 X 5 (X4)Metal100*5 nF**4μSec**
AXUVPS3N/A25 (X4)5 X 5 (X4)Metal100*5 nF**4μSec**
AXUVPS2LPN/A25 (X4)5 X 5 (X4)Metal100*5 nF**4μSec**
AXUVPS3CN/A25 (X4)5 X 5 (X4)Ceramic100*5 nF**4μSec**
AXUVPS4
AXUVPS4C
N/A
N/A
1.25(X4)2.5?To-51000*0.18 nF**0.1μSec**
AXUVPS5N/A24 (X4)3X8?100*5 nF**4μSec**
AXUVPSVN/A33022 X 15PSV20*40 nF**15μSec**
AXUV600MN/A150 (X4)27 X 27Metal20*30 nF**12μSec**
?
Notes:*May be selected for a specific application at no additional cost.
?**Devices with better values may be selected.
?#Four detectors mare needed to realize a variable x-y slit.

Ref: "A Beam Tracking Optical Table of Sychrotron X-ray Beamline" R.G. Van Sifhout, Nucl. Instrum. and methods A, Vol. 403, p. 153-160 (1998)


AXUV Photodiode Arrays

?
?Sensitive Area (mm2)Size (mm)Package TypeShunt Resistance
(M-Ohm)
Dark Current @ 50VCapacitance @ 0VRisetime (10-90%)
AXUV-3ELA#1 (x3)1 x 1 (x3)Ceramic1000300 pA25 pF2 nSec
AXUV-10EL#1 (x10)1 x 1 (x10)Ceramic100010 nA25 pF1 nSec
AXUV-16ELO/G10 (x16)2 x 5 (x16)Ceramic100*2 nF**0.5 μSec**
AXUV-16EL10 (x16)2 x 5 (x16)Ceramic100*2 nF**0.5μSec**
AXUV-20EL3 (x20)0.75 x 4 (x20)Ceramic300*1 nF**0.2μSec**
AXUV-22EL4 (x22)1 x 4 (x22)Ceramic200*1 nF**0.2μSec**
?
Notes:# Use with 10-50 volts bias.
?* May be selected for a specific application at no additional cost.
?** Devices with better values may be selected
?

Ref: "High Resolution Bolometry on the Alcator C-Mod Tokamak (Invited)" R.L. Boivin, J.A. Goetz, E.S. Marmar, J.E. Rice and J.L. Terry, Rev. Sci. Instrum. Vol 70 (1), 260-264 (1999)

? High Speed AXUV Photodiodes
(use with 10-50 volts bias)
?Sensitive Area (mm2)Size (mm)Package TypeShunt Resistance (M-Ohm)Dark Current @ 50VCapacitance @ 0VRisetime (10%-90%) @ 50 V Bias
AXUV20HS1205 ?Ceramic20200.7 nF2 nSec#
AXUV20HS1BNC205 ?BNC20200.7 nF2 nSec#
AXUV12124 ?TO-510020 nA2 nF4 nSec
AXUV552.5 ?TO-510010 nA1 nF2 nSec
AXUVHS1*.05.22 X .22SMA1000100 pA20 pF0.25 nSec
AXUVHS2*.05.22 X .22SSMA1000100 pA20 pF0.25 nSec
AXUVHS3*.005.07 X .07SSMA10050 pA15 pF80 pSec
AXUVHS4*.026.16 X .16SMA1000100 pA20 pF200 pSec
AXUVHS5*11 X 1SMA1000200 pA40 pF700 pSec
AXUVHS5A*11 X 1TO461000200 pA40 pF700 pSec
AXUVHS6*.00063.025 X .025SSMA100020 pA15 pF50 pSec

# 1n-sec@150 volts with high speed amplifiers
*Available with free standing filters

Ref: "Silicon Photodiode Characterization from 1 eV to 10 KeV" G.C. Idzorex and R.J. Bartlett, SPIE Vol. 3114, 349-356 (1997)

With Directly Deposited Filters??To avoid use of fragile freestanding thin filters during XUV experiments and also in space missions, visible blind AXUV photodiodes with integrated thin film filters have been developed. The table below lists available AXUV diodes with different filter materials and their passbands. These filtered diodes exhibit visible light blocking of at least four orders of magnitude. Diodes with higher visible light blocking can be specially selected if required. IRD is continuously making AXUV diodes with many different filters. Users are requested to contact us for their special filter requirements.

The advantages of these integrated detector-filter devices over presently used separate freestanding thin foil filters and detectors are compactness, higher reliability, ease in manufacturing and handling, more stable bandpass and flexibility in design as the filter thicknesses are determined by optical constants and not by the mechanical strength requirement.

The filtered AXUV diodes have been successfully used in the SNOE and SOHO satellites by scientists at the National Center for Atmospheric Research and by scientists at University of Southern California respectively. They are also being used on the HBT-EP tokamak at Columbia University as detectors for the soft X-ray
tomography system. We anticipate that these diodes will be extremely useful in future space missions and other applications like soft x-ray radiometry, x-ray lithography, x-ray microscopy and XUV spectroscopy.
Product NameFilter ThicknessPass Band
AXUV100Cr/W/Au8/100/400 nm< 1 nm
AXUV100Al/Fe *400/450 nm1.7-4 nm
AXUV100Al/Mn2 *500/500 nm1.9-4 nm
AXUV100Al/V *400/600 nm3-5 nm
AXUV100Ti/Zr/Al *250/100/100 nm2.8-5 nm
AXUV100Al/CaF2/Ag *200/1000/250 nm3.5-5.5 nm
AXUV100Ti/Mo/Au40/200/100 nm5-12 nm
AXUV100Ti/Mo/C50/200/70 nm5-13 nm
AXUV100Ti/Mo/Si/C40/200/100/50 nm5-15 nm
AXUV100Zr/C200/50 nm6-15 nm
AXUV100Ti/Zr/Au #20/200/100 nm6-12 nm
AXUV100Ti/C #500/50 nm< 7 nm
AXUV100Ti/Pd #200/100 nm< 11 nm
AXUV100Si/Zr *100/200 nm11-17 nm
AXUV100Mo/Si350/500 nm12.2-15.8 nm
AXUV100Mo/Si2200/100 nm12.2-15.8 nm
AXUV100Ti/C2200/50 nm< 12 nm
AXUV100Al/Zr *125/125 nm17-21 nm
AXUV100Al150 nm17-80 nm
AXUV100Al240 nm17-80 nm
AXUV100GA1250 nm17-80 nm
AXUV100Al3100 nm17-80 nm
AXUV100Al4 *1000 nm17-80 nm
AXUV100Al5300 nm17-80 nm
AXUV100Al/C200/50 nm17-36 nm
AXUV100Al/Nb/C #250/50/50 nm18-21 nm
AXUV100Al/Mn #200/100 nm25-35 nm
AXUV100Al/Mn3270/100 nm25-35 nm
AXUV100Cr/Al60/150 nm28-40 nm
AXUV100Cr/Al2 #100/200 nm27-37 nm
AXUV100Cr/Al3100/270 nm27-37 nm
AXUV100Sn: 2% Ge200/10 nm53-74 nm
AXUV100In/SiC200/20 nm76-99 nm
AXUV100LA200 nm117-131 nm
AXUVSP2Al150 nm17-80 nm
AXUV96Al #300 nm22-78 nm
AXUV96Ti/Mo/C #50/200/70 nm5-13 nm
AXUV96Sn: 2% Ge200/10 nm53-74 nm
AXUV96In/SiC200/20 nm76-99 nm
AXUV20Ti/Mo/C50/200/70 nm5-13 nm
AXUV20Mo/Si43.5/500 nm12.2-15.8 nm
AXUV20Al300 nm17-80 nm
AXUV20Ti/C200/50 nm< 15 nm
AXUV20HS1Si/Zr100/200 nm11-18 nm
AXUV20HS1Al5300 nm17-80 nm
AXUV20HS1Mo/Si350/500 nm12.2-15.8 nm
AXUV20AMo/Si350/500 nm12.2-15.8 nm
AXUV20ASi/Zr100/200 nm11-18 nm